Generation Next: Advanced Substrate Engineering


Generation Next: Advanced Substrate Engineering

New Materials for Moore

Sub-22nm transistor engineering has put traditional silicon on notice. Moving Moore's Law to the next nodes requires new material engineering that delivers high mobility and better isolation for transistors. From fully-depleted SOI to germanium-doped substrates, III-Vs, graphene, and even molybdenum disulfide, researchers are looking to advanced substrate technologies for the solutions that will keep device scaling on track.

The Generation Next: Advanced Substrate Engineering Pavilion will spotlight companies and research institutions focused on the next generation of advanced substrates in
areas including:

  • Wafer/Substrate Manufacturing
  • Compound Semiconductor Technology
  • Process Tool Technologies, including MOCVD
  • Ion Implant
  • Atomic Layer Deposition

The Generation Next: Advanced Substrate Engineering Pavilion will be held in conjunction with technical sessions addressing the critical issues, challenges, and opportunities
in advanced substrate technology:

  • Substrates for Sub-22 nm: Materials Research Beyond Silicon
  • Advanced Films
  • Disruptive Compound Semiconductor Technologies

For more information about exhibiting opportunities within the Generation Next: Advanced Substrate Engineering pavilion, contact Nick Antonopoulos at [email protected] / +1.408.943.6986.